Algorithm Developer

Algorithm research

We are looking for an MSC/PhD candidate with analytical capabilities to be part of a small group which develop new 3D Metrology algorithms

What’s in it for you?

Working on highly innovative technology in the semiconductor industry.

It involves, deep mathematical background, signal processing and estimation, model analysis and multidisciplinary knowledge from physics and algorithms.

Our Group:

Patterning, MesoVision group

What you'll be doing:

• Algo Research and implementation in the fields of Computer vision, Machine learning and Deconvolution of 3D structures
• Develop statistical models including error bounds
  
  

What you should have?

• Experience in Computer Vision: Registration and segmentation
• Experience in signal processing and estimation theory: Statistical modeling, Maximum likelihood, etc.
• Experience in Machine Learning: Error bounds, algorithms and optimizations
• Experience in SEM imaging: an advantage
  
  

Who we are?

Applied Materials Israel is home to the Process Diagnostics and Control business unit (PDC). Based in Rehovot, we develop, manufacture and market cutting-edge machine learning and computer vision-based metrology and inspection products that are essential elements in wafer fabrication. By playing a significant role in enabling the production of the next generation of microchips, our expertise enables our customers to transform possibilities into reality.

Qualifications

Education:

Bachelor's Degree

Skills

Certifications:

Languages:

Years of Experience:

4 - 7 Years

Work Experience:

Additional Information

Shift:

Day (Israel)

Travel:

Yes, 10% of the Time

Relocation Eligible:

No

Applied Materials is an Equal Opportunity Employer committed to diversity in the workplace. All qualified applicants will receive consideration for employment without regard to race, color, national origin, citizenship, ancestry, religion, creed, sex, sexual orientation, gender identity, age, disability, veteran or military status, or any other basis prohibited by law.